With their method of etching geometric patterns on silicon wafers, ASML’s inventors Erik Loopstra and Vadim Banine were awarded the Popular Prize of the European Inventor Award 2018. The Award ceremony held today in Paris, Saint-Germain-en-Laye, was attended by some 600 guests from the areas of politics, business, intellectual property, and science. The two inventors and their teams at ASML and Zeiss developed an extreme ultraviolet lithography (EUVL) production system for smaller, faster and more powerful semiconductors.

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Author profile picture Bart Brouwers is co-founder and co-owner of Media52 BV, the publisher of innovationorigins.com.